Nanoelectronics by unknow

Author:unknow
Language: eng
Format: epub
ISBN: 9783527340538
Publisher: John Wiley & Sons, Inc.
Published: 2017-05-01T00:00:00+00:00

12.2.4 Alternative Lithographies: E-Beam Maskless, Nanoimprint

A number of lithography approaches that have not be used extensively in the manufacturing of integrated circuits are nanoimprint and e-beam maskless lithography (or parallel e-beam direct write). These techniques have made quite some progress over the last 15–20 years as they all had the ambition to take over when 193 nm immersion lithography would be running out of steam. Still today, with the delayed insertion of EUV lithography, several of these lithography options are being prepared to take over (part of) that IC market.

Download

Copyright Disclaimer:
This site does not store any files on its server. We only index and link to content provided by other sites. Please contact the content providers to delete copyright contents if any and email us, we'll remove relevant links or contents immediately.